Fabrication of Nanoimprint Stamps by Nanosphere Lithography

Abstract

AbstractAnovel scheme for the fabrication of large-area nanoimprint stamps has been developed based on the utilization of a combination of nanosphere lithography and reactive ion etching. Both single and double layer polystyrene beads have been employed to construct well-ordered, periodic silicon nanopillar arrays. The nanopillar arrays fabricated by this method have been successfully used as the stamps for nanoimprint lithography. Our result indicates that this approach is capable of producing large-area sub-50 nm periodic nanostructures.