Fabrication of nano-dimensional features in FOTURAN using focused ion beam technology

Abstract

This chapter presents the findings of an investigation carried out to determine the feasibility of manufacturing nanodimensional features in photoetchable glass (Foturan™) using focused ion beam technology. The standard processing techniques for producing features (UV lithography and UV lasers) in this material are limited by grain structure giving minimum feature size, typically 10 microns. Focused ion beam technology (FIB) offers two potential advantages—there is no additional processing such as wet etching in hydrofluoric acid and there is the potential to manufacture nanodimensional features, smaller than the micron scale that can be achieved using UV patterning with wet etch. A major obstacle is the local charging that occurs when an insulator such as Foturan™ glass is subjected to FIB irradiation. This can be overcome by the use of electron charge neutralization. TRIM code Monte Carlo simulations of the ion implantation process clarify the ion sputter and implant mechanisms occurring during the FIB etch process.