Abstract
We made a multiple electron microcolumn array. The electron source was made of either a Si based field emission array or a nickel coated array to keep the distances among sources equal. Laser micromachining was used to obtain a self-aligned microcolumn with five lenses: an extractor, an accelerator, and an Einzel lens. The aberration of each column was greatly improved compared to anodically bonded Si lens microcolumns. The field emission electron beam pattern was obtained from a multiple microcolumn. Its I–V dependence and possible application to the electron beam lithography with high throughput is discussed.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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