Abstract

Discrete millimetre-wave devices, i.e. Gunn and IMPATT diodes, dissipate a large amount of power in the form of heat. Devices fabricated with an integral heat sink (IHS) are known to show superior performance compared with conventional devices. A novel process was developed for the fabrication of IHS integral bonding ribbon (IBR) millimetre-wave devices. The method employs “through holes” generated on the wafer as marks for “front to back” alignment of the IHS and IBR. The process is found to be highly reproducible and versatile. Devices have shown several advantages in terms of ease of processing and yield. The process can thus be used to fabricate devices different semiconductor materials and possibly for all devices requiring the IHS-IBR configuration.

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