Fabrication of Micro-Patterned 2D Nanorod and Nanohole Arrays by a Combination of Photolithography and Nanosphere Lithography

Abstract

This paper reports a facile fabrication technique for micro-patterned two-dimensional (2D) nanorod and nanohole arrays. This technique is based on a combination of two simple and scalable processes: photolithography for micro-patterns and nanosphere lithography (NSL) for nano-patterns. Mixed patterns, such as micro-scale line patterned 2D SiO2 nanoarrays, can be routinely fabricated over a quartz substrate owing to the high reproducibility of this simple method. In micro-patterned 2D nanoarrays, the structural dimensions of micro-patterns can be controlled by general optimization of photolithography techniques; structural dimensions of nano-patterns can be controlled with the NSL technique. We demonstrate micro-patterned fluorescence images of SrGa2S4:Eu2+ thin-film phosphors (TFPs) by depositing TFPs on micro-patterned 2D SiO2 photonic crystal (PC) nanoarrays using rf-magnetron sputtering technique. It is expected that photolithography-assisted NSL will be incorporated easily in the fabrication of micro-patterned PC for the various photonic or optoelectronic devices.