Fabrication of low‐loss 45° integrated mirrors on dielectric optical waveguides

Abstract

AbstractHigh‐density low‐loss dielectric optical interconnection is demonstrated on a monomode optical waveguide compatible with microelectronics technology. Low‐loss self‐aligned integrated mirrors (SAIM) on a dielectric (polyimide‐silicon nitride‐polyimide) optical waveguide have been fabricated. Optimization of the reactive ion etching process has been made in order to obtain vertical, homogeneous etched sidewalls. Using such a process, 45° integrated mirrors present reflection losses of 0.6 dB at a 830‐nm wavelength (quasi‐TE mode).