Abstract
We herein report the development of the sputtering process for the fabrication of low-temperature thin film solid oxide fuel cells (TF-SOFCs) supported by anodized aluminum oxide (AAO). The process development has been conducted for each component, anode, electrolyte, electrolyte/cathode interlayer, and cathode to scale up the cell from 1cm x 1cm to 15 cm x 15 cm. In order to fabricate a uniform thin film regardless of the size of AAO, sputtering conditions such as power, pressure, angle, target-to-substrate distance (TSD), and time have been developed. The recipe for the anode and cathode has aimed at a porous structure with nano-grains for high reactivity. In contrast, the recipe for the electrolyte has been optimized for thickness uniformity and high density. With these sputtering recipes TF-SOFCs with the required microstructure and thickness uniformity have been successfully fabricated on 15 cm x 15 cm AAO substrates.
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