Abstract
A technique for incorporating a mirror into the core of a silica-based channel waveguide is described. Both up reflecting mirrors for hybrid integration and down-reflecting mirrors for monolithic integration can be fabricated using this technique. The proposed fabrication method is based on a combination of low temperature hollow cathode PECVD for silica-based waveguide deposition and a novel technique for forming a reflecting facet by wet chemical etching of PECVD silica.
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Schedule a callMore From: Journal of lightwave technology : a joint IEEE/OSA publication
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