Abstract
This paper demonstrates an approach to fabricate large-scaled (70 /spl times/70 mm) patterned organic light-emitting devices (ITO/CuPc/NPB/Alq3/LiF/Al) on the flexible polyethyleneterephthalate substrates using low-pressure imprinting lithography. The patterns of the pixel array were defined in crossed-strip style with anode patterned by imprinting techniques followed by wet chemical etching and cathode strips deposited using metal mask. The measured results were: The turn-on voltage of the device was 7.5 V; the luminous efficiency reached 1.13 lm/W (3.04 cd/A) at a luminance of 3.8 cd/m/sup 2/ and its maximum luminance was 2440 cd/m/sup 2/, which were comparable to the performances of the devices patterned by conventional photolithography.
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