Abstract
Photomasks are fabricated using different methods starting from rubylith coordinatography to electron beam exposure systems. Masks are used for different kinds of devices with different tolerances and requirements. Therefore, certain methods are preferred over others for specific devices. In this paper, a method of photomask fabrication is discussed in which a step-and-repeat camera is used to compose an accurate mask geometry containing long fine lines by using several very simple reticles. The procedure along with the different options available have been described. The main advantage here is that butting and overlap errors can be reduced substantially.
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