Abstract
The fabrication of sub-micron-thickness ion-sliced yttrium-aluminum-garnet thin films on silica is performed by He + implantation and the Cu–Sn bonding. The formation of blisters on He-ion-implanted YAG crystals caused by thermal annealing is investigated. YAG thin films with an area of approximately 6 mm × 5 mm are produced. The implanted YAG crystals and fabricated YAG thin films are investigated using optical, transmission electron, and scanning electron microscopy, as well as prism-coupling methods. A YAG thin film with a low-refractive-index silica cladding can be used as a waveguide to manufacture photonic components with high refractive index contrast. • We report the fabrication of ion-sliced YAG thin films on SiO 2 for the first time. • The blistering behavior is investigate. • A sub-micron-thickness YAG thin film with an area of 6 × 5 mm is fabricated. • A YAG thin film on SiO 2 cladding layer can act as a slab waveguide.
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