Fabrication of integrated patterns using lithography and particles assembling techniques

Abstract

This paper describes both physical and chemical techniques of nanoparticle assembling on a substrate pre-patterned by optical lithography or soft UV nanoimprint lithography. Integrated patterns of mono dispersed particles can be achieved by capillary forces, whereas functionalized particles could be assembled into holes of a metallic layer by chemical processing. To demonstrate the applicability of the methods, the fabricated patterns were transferred into a UV curable resist or a silicon dioxide layer by reactive ion etching. In addition, particles assembled into a microfluidic channel were used as artificial gel to show the feasibility of stretching single-strand T4 DNA molecules.