Abstract
A novel electrochemical route for the preparation of hydrophobic fluorinated amorphous carbon (a-C:F) films with nanostructured surfaces on single crystal silicon substrate was reported. The films were investigated in terms of the surface morphology, chemical composition, microstructure and hydrophobic behavior. The results showed that a highly uniform and densely packed bamboo shoot-like nanostructure was obtained without any use of template. The incorporation of fluorine presented mainly in the forms of CF 2 chains and C CF x ( x = 1, 2) in the films. Sessile drop water contact angle measurements showed that the contact angle of a-C:F films deposited by electrochemical route was about 145°, which can be attributed to the lower surface energy of CF x groups and higher diffusion resistance of the special nanostructured surface to water. Moreover, the related growth mechanism of the resulting films in liquid-phase electrodeposition is discussed as well.
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