Abstract

This paper describes a procedure to replicate a polymeric wavelength filter. In this work, the grating structure on a polymer is fabricated first using holographic interferometry and micro-molding processes. The polymeric wavelength filters are produced by a two-step molding process where the master mold is first formed on a negative tone photoresist and subsequently transferred to a PDMS mold; following this step, the PDMS silicon rubber mold was used as a stamp to transfer the pattern of the polymeric wavelength filters onto a UV cure epoxy. Initial results show good pattern transfer in physical shape. At the Bragg wavelength, a transmission dip of -15.5 dB relative to the -3dB background insertion loss and a 3-dB-transmission bandwidth of ?6nm were obtained from the device.

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