Abstract
Boron-doped (p-type) μc-Si:H thin film window layers are widely used in silicon thin film solar cell fabrication due to their low optical absorption and high doping efficiency compared with their amorphous counterparts. In this paper, the layer-by-layer method is investigated to fabricate high-quality thin p layers (< 30nm). To investigate the influence of the type of substrate, p layers are deposited onto planar glass and textured glass (bare or coated with ZnO:Al thin film). The crystalline volume fraction (crystallinity) and conductivity of the deposited p layers are measured to characterise the films’ properties. We find that by increasing the number of hydrogen plasma treatment steps and their duration, the films’ crystallinity and electrical properties improve strongly. We also find that the substrate surface roughness strongly influences the film properties. This may be due to the different nucleation conditions resulting from the various substrate topographies.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
