Abstract
A novel technique is developed for fabricating highly oriented Si nanoparticles (SNP) embedded in SiO2 using multiple low energy oxygen ion implantation during Si molecular beam epitaxy. The SNPs are of nearly isotropic but faceted morphologies with almost perfect crystallinity as revealed by transmission electron microscopy. The preferred axis of SNP cores is found to be aligned to [100] due to epitaxy on a Si(100) substrate, reflecting the highly oriented character of SNPs. Visible luminescence from SNPs with dimensions approaching the quantum confinement regime is observed at room temperature.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
