Abstract
Highly dense arrays of diamond nanopillars have been fabricated using nanocrystalline diamond films (NCD) as the starting material. The fabrication process consisted of electron beam lithography (EBL), aluminum mask deposition and inductively coupled O2 plasma reactive ion etching. The EBL pattern fidelity was enhanced by proximity corrections and dose variations. Optical characterizations of the arrays indicated the incorporation of silicon-vacancy centers during NCD growth as well as enhanced fluorescence and photoluminescence intensities in the well-developed pillar arrays. Transferring this fabrication method to monocrystalline diamond, such dense arrays of diamond nanopillars could be applied in quantum photonics as emitter arrays or photonic crystals upon integration of color centers.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
