Abstract
Certain aspects before and during the fabrication of single‐crystal diamond (SCD) membranes are highlighted, which are decisive to obtain high‐quality membranes with low surface roughness values around 0.2 nm on a small area scale. In addition to the requirements for the starting material, including a high planarity and a moderate surface roughness, the importance of cleaning processes to minimize particles and impurities before and during the structuring is emphasized. With the help of a planarization procedure, consisting of a combination of different Ar/Cl2 recipes with low etch rates, surface defects like grooves due to polishing are minimized and smooth surfaces are acquired. Severe micro‐masking can be prevented by the application of a cyclic Ar/Cl2 + O2 recipe, allowing finally the fabrication of defect‐minimized and planarized SCD membranes in the thickness range between a few microns and a few hundred nanometers. The high quality of the structured SCD membranes is evidenced with a morphological as well as optical characterization via fiber‐based microcavity measurements.
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