Abstract
Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.
Highlights
IntroductionResearch on periodic structures on the nanoscale and their applications has increased remarkably
During the last decades, research on periodic structures on the nanoscale and their applications has increased remarkably
In this paper we report on the fabrication of high-quality and high-resolution submicron gratings over large areas in Au thin films leading to a strong plasmon resonance effect
Summary
Research on periodic structures on the nanoscale and their applications has increased remarkably. This approach utilizes a lithographic process on a photoresist to define high-resolution sub-micrometer periodic structures These patterns are very sensitive to mechanical vibrations during fabrication as the exposure time of the photoresist can range from a few seconds up to a few minutes [23]. In this paper we report on the fabrication of high-quality and high-resolution submicron gratings over large areas (over 80 mm with less than 0.25% deviation in period over the entire sample) in Au thin films leading to a strong plasmon resonance effect This was achieved by utilizing a new approach that combines nanosecond pulsed laser interference lithography on a photoresist layer with standard etching techniques allowing a precise control of the depth of the fabricated gold grating.
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