Abstract
The high-aspect ratio microstructures were fabricated by action of synchrotron x-ray on the synthesized tetraacrylate monomer: 3-[4-({4-[2,3-bis(prop-2-enoyloxy)propoxy]phenyl}sulfanyl)phenoxy]-3-(prop-2-enoyloxy)propan-2-yl prop-2-enoate. The storage ring VEPP-3 (electron energy is 2GeV) at the station «LIGA» of BINP SB RAS was used as the source of the synchrotron radiation. The dependence of the thickness of the x-ray polymerized samples vs. the absorbed dose was measured in the range 1-100kJ/cm3. The possibility of use synthesized tetraacrylate monomer for the microstructures recording with aspect ratio 1:25 by the x-ray lithography metod was demonstrated.
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