Abstract
The cost-effective fabrication process for high-aspect-ratio microstructures using X-rays depends largely on the availability and quality of X-ray masks. The fabrication of X-ray masks using commercially available graphite sheet stock, as a mask membrane is one approach that is designed to reduce cost and turnaround time. Rigid graphite offers unique properties, such as moderate X-ray transmission, fairly low cost, electrical conductivity, and the ability to be used with either subtractive or additive processes [1, 2]. This paper will demonstrate the potential of a cost-effective, rapid prototyping of high-aspect-ratio microstructures (HARMs) using graphite masks. The graphite wafer accommodates both the intermediate mask and the working mask. In order to allow a direct comparison of the graphite mask quality with other X-ray masks, the primary pattern was derived from a Ti X-ray mask using soft X-ray lithography (XRL).
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