Abstract
Masks made from graphite stock material have been demonstrated as a cost-effective and reliable method of fabricating X-ray masks for deep and ultra-deep x-ray lithography (DXRL and UDXRL, respectively). The focus on this research effort was to fabricate masks that were compatible with the requirements for deep and ultra deep X-ray lithography by using UV optical lithography and gold electroforming. The major focus was on the uniform application of a thick resist on a porous graphite substrate. After patterning the resist, gold deposition was performed to build up the absorber structures using pulsed- electroplating. In this paper we will report on the current status of the mask fabrication process and present some preliminary exposure results.
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