Abstract
A relatively simple technique for fabrication of GaAs-based quasi-three-dimensional photonic crystals has been investigated. Selective impurity-induced layer disordering and wet oxidation techniques are utilized. Fourier-transform infrared spectroscopy measurement reveals a stop band between 15 and 20 μm for a sample with scattering center spacing of 6.3 μm. Another narrow transmittance dip is observable in the wavelength range of 1.1–1.58 μm, with an attenuation of 12 dB at 1.18 μm. The process is reproducible and lends itself to integration with other optoelectronic and electronic devices on the same substrate.
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