Abstract
In this presentation, cross-stacking MoS2/graphene hybrid patterns for the application to advanced flexible opto-electronic devices have been performed by the soft-lithographic patterning method. Well-defined MoS2/graphene hybrid pattern was produced simply by a soft lithographic patterning technique without any defects. In-depth exploration for the optical properties of diverse cross-stacking photodetectors based on MoS2/graphene patterns was also implemented. Furthermore, cross-stacking MoS2/graphene based on the woven structure was transferred onto a flexible polyethylene terephthalate (PET) substrate for the analysis of mechanical properties of devices. Eventually, this method should pave the way for practical applications of transparent and flexible nano-electronic devices based on 2D materials.
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