Abstract
Oxygen reactive sputtering processes for NiFe were investigated, and exchange coupled films containing antiferromagnetic NiO were fabricated. Two processes were used for fabricating oxide layers. In one with low oxygen concentration, the oxide layer showed an exchange coupling field of 11.5 Oe for a 300Å NiFe layer. In the other, with high oxygen concentration, the oxide layer showed no exchange coupling with NiFe films. X-ray diffraction and X-ray photoelectron spectroscopy revealed that oxides fabricated in a high oxygen concentration consist of small grains, and contain a small amount of Ni2O3 in addition to NiO.
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