Abstract
Abstract A poly(methyl methacrylate) (PMMA) film capable of dissolving an organic dye was prepared at an elevated temperature under ultra high vacuum (UHV). Residual solvents in PMMA film which may reduce the threshold power of irradiated light to breakdown were analyzed by means of quadrupole mass spectroscopy. It has been established that treatment of the polymer under UHV is essential for optical use.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
