Abstract
The double nanohoneycombs (Al/SiO 2 ) on glass and Si substrates were fabricated by the two-step processes of nanosphere lithography (NSL). The working parameters of the fabrication processes were analyzed and the factors affecting the size of nano-homeycombs, such as controlling nanosphere size, lift-off nanosphere and the second NSL process were elucidated. In the first NSL process, an ordered single layer of polystyrene (PS) nanosphere with a diameter of 1000 nm was spin-coated on the substrates. Then, the PS nanospheres were modified by oxygen plasma works as deposition masks. By Al film deposition and lift-off processes, we fabricated ordered periodic nano-homeycombs (Al) arrays. After the second NSL process and SiO 2 film deposition, we fabricated ordered periodic double nanohomeycombs (Al/SiO 2 ) arrays. This technique forming double nanohoneycombs, especially with desired period, is expected to be a candidate for wide nanostructure applications such as photonic crystals, optpoelectronic devices, sensors, data storage, fuel cells, etc.
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