Abstract
This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure.
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