Abstract
This study investigates a new process for fabricating a diffraction grating in a flexible polydimethylsiloxane (PDMS) sheet by using a high-intensity femtosecond-pulsed laser (FS-laser). Unlike soft-lithography with the bonding technique, FS-laser direct writing provides a unique micromachining method for fabricating an embedded diffraction grating (inside a PDMS substrate) with laser pulses of visible light. This approach is a nonlinear mask-less process for rapid prototyping. The wavelength of the FS-laser beam is frequency-doubled to 517 nm. The repetition rate and pulse width of the FS-laser system are 100 kHz and 350 fs, respectively. An embedded PDMS diffraction grating is successfully demonstrated based on a calculated optical phase shift structure.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.