Fabrication of defects in periodic photonic crystals using a phase only spatial light modulator

Abstract

Here we present single exposure holographic fabrication of embedded defects in photonic crystal structures in a negative photoresist using a spatial light modulator (SLM). A phase pattern is engineered to form a desired interference pattern and displayed on a phase-only SLM. The resulting first order beams at the Fourier plane are used to recreate the interference pattern. Negative and positive defects are added to the photonic crystal in the following ways. A void-type defect is produced in two dimensional photonic crystal structures by replacing the phase of the engineered phase pattern with a constant value at the points where the defect is desired. And a positive bump defect can be made by allowing the zeroth order beam to interfere with the first order beams. Through these methods, it is possible to fabricate arbitrary shaped defect structures in photonic crystals through a single exposure process, thus improving cost effectiveness and simplifying the fabrication process of integrated photonics.