Abstract
In this paper, the use of Focused Ion Beam (FIB) milling as an alternative technology to electron-beam lithography in production of complex 3-D-structures such as “Motheye” lenses for Step and Flash Imprint Lithography (S–FIL) templates is discussed. Alterations introduced to conventional template fabrication techniques and the advantages and disadvantages of the proposed template fabrication method over conventional routes are discussed. Comparing the template and replication, we show that the surface topographies are almost identical, and thus FIB milled structures can be consistently replicated employing the S–FIL technology.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
