Fabrication of Carbon Nanodot Arrays with a Pitch of 20 nm for Pattern-Transfer of PDMS Self-Assembled Nanodots

Abstract

We investigated the fabrication of self-assembled nanodot array using poly (styrene)-poly (dimethyl-siloxane) (PS-PDMS) block copolymer and its transfer technique as a promising method to fabricate magnetic nanodot arrays for ultrahigh density recording. A carbon (C) layer with a high etch-resistance was especially adopted for magnetic nanodot fabrication. We fabricated PDMS nanodot using PS-PDMS block copolymer with a molecular mass of 11,700-2,900 g/mol. The nanodots were first transferred into silicon (Si) layer and then into C layer on Si substrate by carbon tetrafluoride (CF4) and oxygen (O2) reactive ion etching (RIE), respectively. We succeeded in fabricating C nanodots with a diameter of 10 nm and an average pitch of 20 nm.