Abstract

We optimized fabrication conditions of cholesteric liquid crystal (CLC) films; 1) amount of photo-initiator, 2) exposure conditions. Based on these conditions, we could succeed in fabricating broadband CLC films with Δλ ≈ 250 nm. We also examined the spatial helical pitch gradient structure fabricated here using a field emission-scanning electron microscope (FE-SEM) at a freeze-fractured cross-section of the fabricated CLC films.

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