Abstract
The blazed grating is one of the key elements in a spectrometer. Hence we have adopted a new method of its fabrication. First, the combination of ion beam etching (IBE) and reactive IBE is used to fabricate a native substrate grating mask to replace the traditional photoresist grating mask. This is because the former mask allows for more accurate control of the profile than the latter. Then tilted IBE is used to etch the native substrate grating to ensure the precise control of the blazed angle and antiblazed angle. Therefore, an optimal blazed grating profile is successfully fabricated. Two types of blazed gratings with the same period of 833 nm have been fabricated: one with the blaze angle of 11 deg and the antiblaze angle of 72 deg; and one with the blaze angle of 20 deg and the antiblaze angle of 68.5 deg, respectively.
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