Fabrication of Anti-reflection Structure using Photo-curable Polymer

Abstract

Antireflection (AR) structure is the most promising nano-scale application for AR film such as flat panel display, mobile phone display and so on. Ultraviolet nanoimprint lithography (UV-NIL) is a potentially powerful tool for such a nanofabrication, thus, we have been established the fabrication method of AR structure film using photo-curable polymer and UV-NIL. The AR structure mold was fabricated by oxygen ion beam irradiation to glassy carbon (GC) surface. This process can obtain large area and uniform AR structure surface easily. The AR structured surface has strong adhesive force, thus, release layer is important. The developed release method is chromium deposition and succeeding fluorinate silnane coupling agent. This release layer enables to transfer during UV-NIL. First, AR structures were replicated on PET film and reflection property was measured. However, interface between AR structured polymer and PET generates interface reflection. To reduce the interface reflection, we have been developed the fabrication method of self-support photo-curable polymer with AR structures. The method is utilizing polyvinyl alcohol (PVA) instead of PET film. PVA is water-soluble material, thus, after the AR structure replication by UV-NIL, PVA was removed by dipping water. The fabricated self-support film is 0.5 % reflectivity at visible light wavelength.