Abstract

A range of experimental conditions have been investigated for the growth of composite SiO2/ZrO2 and SiO2/TiO2 thin films by liquid phase deposition (LPD) on Si wafers. The film thickness and refractive index (n) are obtained by ellipsom- etry, elemental composition was determined by X-ray photoelectron spectroscopy (XPS), and film morphology was detected by scanning electron microscopy (SEM). Excessively long deposition time and high deposition temperature are found to be unfavorable for formation of compact films even though the film growth rate is improved under these conditions.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.