Abstract
TiO2 is a promising photocatalyst used in practical environmental remediation. TiO2 photocatalysts are usually implemented in two forms: suspended powder and immobilized thin films. A simple technique for fabricating TiO2 thin film photocatalyst was developed in this work. The fabricated TiO2 thin film photocatalyst featured a homogeneous nanowire layer grown in situ on the parent Ti plate. The optimized fabrication protocol was to soak the ultrasonically cleaned and acid-washed Ti plate in 30% H2O2 solution containing 3.2mM melamine and 0.29M HNO3 at 80°C for 72h and then anneal at 450°C for 1h. TiO2 nanowires with uniform diameters were homogeneously arrayed on the Ti plate surface. The thickness of the TiO2 nanowire array layer was 1.5μm. The pore properties of the TiO2 thin film were close to those of P25. The band gap of the fabricated photocatalyst was 3.14eV. The photocatalytic activity of the fabricated photocatalyst toward 10mg/L RhB and 1mg/L CBZ demonstrated greater than 60% degradation under 2h UVC irradiation. The RhB and CBZ degradation efficiencies remained at a good level after 5 consecutive cycles. Mechanical wearing, such as 2min sonication, will not lead to significant suppression of the photocatalytic activity. Photocatalytic RhB and CBZ degradation using the fabricated photocatalyst favored an acidic > alkaline > neutral environment. The presence of Cl- slightly suppressed the photocatalytic degradation kinetics. However, RhB and CBZ photocatalytic degradation kinetics were promoted in the copresence of SO42- or NO3-.
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