Abstract
In this work the results of experimental studies of a fabrication of advanced probes for Atomic Force Microscopy (AFM) using Focused Ion Beam (FIB) and nanolithography are reported. Ability to restore the functionality of broken AFM probe tips is shown. The superior performance of FIB-fabricated probes by observing AFM images of the nanostructures is demonstrated. It is shown that the formation of multiprobe AFM cantilevers by FIB-induced deposition of tungsten allows creating an electrical measurement tool for nanotechnology and high-performance instrument for probe nanolithography. It is shown that the use of modified cantilevers for the diagnostics of submicron structures allows one to minimize the artefacts of AFM images, as well as to increase the accuracy of the obtained results.
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