Fabrication of a new BEAMETR chip for automatic electron beam size measurement

Abstract

BEAMETR (BEAm METRology) technique is demonstrated as an attractive solution for automatic measurement of electron beam sizes in two coordinates. The method associates one software and one specially designed pattern chip. The fabrication of new BEAMETR design is performed by electron beam lithography and metal lift-off. A specific bi-layer resist system and proximity correction is used for achieving the requirements for the pound-key shape of BEAMETR pattern. Beam sizes in two coordinates (x,y) of Scanning Electron Microscope are measured for various operating conditions. This method allows measuring electron beam sizes down to 2 nanometers.