Fabrication of a Monolithic Array of Three Dimensional Si-based Ion Traps

Abstract

Segmented linear ion trap arrays are versatile devices that are increasingly used to study quantum physics and demonstrate the fundamental principles of quantum information processing. Traps with three-dimensional (3-D) electrode geometries can create a superior confining potential for ions. However, the realization of a monolithic 3-D microchip trap with scalable fabrication technology remains challenging. In this paper the microfabrication of a monolithic array of 3-D ion microtraps in a semiconductor chip is presented. The electrode structure is formed by micromachining a silica-on-silicon wafer and metallizing the dielectric with gold. The fabrication method uses conventional semiconductor wafer processing tools and techniques. The specific operating characteristics which demonstrate the suitability of the chosen material system and fabrication process are presented.