Abstract
In this paper, we present a new, to the best of our knowledge, structure of double pinhole/micro-lens array (DP/MLA) with two center-depth planes, used for improving the depth-of-field (DOF) of integral imaging (II), which can be fabricated by a combination of lithography and inkjet printing. The results show that a black circular groove array prepared by lithography can be used for micro-lens location and reduce the stray light for II. By controlling the parameters of the inkjet printing system, DP/MLA with high precision, high alignment, and good focusing ability can be achieved. When the fabricated DP/MLA is applied in the II system, the reconstructed image has a better three-dimensional (3D) image with higher DOF than that by traditional MLA and higher quality than that by ordinary double-layer MLA.
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