Fabrication of a high-throughput near-field optical probe using a double metallayer

Abstract

Metal-coated oxide nano-aperture arrays have been fabricated using a micro-fabricationtechnique including a stress-dependent oxidation, an isotropic wet etching of silicon oxide,and the metal deposition. Au, Al, and Al/Ti double metal layers have been deposited onnano-size oxide aperture arrays in order to provide a better uniformity of the coated metalfilm and an ideal aperture shape. The introduction of the Ti buffer layer reduced surfaceroughness during the reflow process of Al deposition and resulted in an ideal circular typeaperture shape.