Fabrication of a high-density nano-porous structure on polyimide by using ultraviolet laser irradiation

Abstract

A new approach for fabricating a high-density nano-porous structure on polyimide (PI) by using a 355-nm UV laser is presented here. When PI was irradiated by using a laser, debris that had electrical conductivity was generated. Accordingly, that debris caused electrical defects in the field of electronics. Thus, many researchers have tried to focus on a clean processing without debris. However, this study focused on forming a high density of debris so as to fabricate a nano-porous structure consisting of nanofibers on the PI film. A PI film with closed pores and open pores was successfully formed by using a chemical blowing agent (azodicarbonamide, CBA) in an oven. Samples were precured at 130 °C and cured at 205 °C in sequence so that the closed pores might not coalesce in the film. When the laser irradiated the PI film with closed pores, nanofibers were generated because polyimide was not completely decomposed by photochemical ablation. Our results indicated that a film with micro-closed pores, in conjunction with a 355-nm pulsed laser, can facilitate the fabrication of a high-density nano-porous structure.