Fabrication of 0.1 µm Line-and-Space Patterns using Soft X-Ray Reduction Lithography

Abstract

Soft X-ray projection lithography with a reduction rate of 32 was examined using Mo/Si-multilayer-coated Schwarzschild optics. The optics were designed to function at 13 nm, and were aligned with the synchrotron radiation light source. The patterns on a transmission mask were imaged in a 0.18-µm-thick polymethyl methacrylate resist. Line-and-space patterns down to 0.1 µ m were fabricated.