Abstract
Preferentially oriented anatase TiO 2 films were uniformly deposited on the surface of stainless steel substrate by a liquid phase deposition (LPD) method at 60 °C using TiF 4 and H 3BO 3 as precursors. The as-prepared TiO 2 films were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and high-resolution transmission electron microscopy (HRTEM). The photocatalytic activity of the as-prepared TiO 2 films was evaluated by the photocatalytic oxidation of NO in the gaseous phase. It was found that the deposition conditions, such as the precursor concentrations (H 3BO 3 and TiF 4), the deposition time and the pH, had an obvious effect on the formation of oriented TiO 2 films. The prepared TiO 2 films showed a preferential orientation in the [0 0 1] direction perpendicular to the stainless steel substrate. A formation mechanism was proposed to account for the preferential orientation and textured morphology of the TiO 2 films. The photocatalytic oxidation of NO indicated that the preferentially oriented TiO 2 films exhibited an obvious photocatalytic activity without high-temperature calcination.
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