Abstract
Thin organic films with oxygen-bearing functional groups (hydroxyl, carboxyl, …) were prepared by “co-polymerizing” gas mixtures of ethylene (C2H4) and one of several O-containing oxidizer molecules, O2, CO2, or N2O. This was done either by vacuum-ultraviolet (VUV) photo-polymerization or by low-pressure r.f. plasma-assisted CVD. The gas mixture ratio, R, permits one to control total oxygen concentration, [O], as well as the relative proportions of the various functionalities. Analyses were performed by XPS (with or without chemical derivatization using TFAA to determine [OH] content), and IRRAS-FTIR. Temporal and structural stability (mass change) of deposits under exposure to air or water was examined; altogether, data confirmed different reaction pathways for VUV and PECVD.
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