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Abstract
Modified electron-beam lithography system and ion-beam etching was used to make elliptical-shaped Bragg-Fresnel multilayer lenses (BFML) in the soft X-Ray range. As substrate for BFML, a Nickel-carbon multilayer X-Ray mirror was used. It consists of 40 double-layers with a period of 4,8 nm having an 11% reflection coefficient at 6 nm wavelength.Special software for E-beam exposure system was developed in order to decrease influence of proximity effect and field distortion.
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