Abstract
AbstractLithium niobate has a wide variety of applications because of its excellent ferroelectric, piezoelectric and electrooptic properties. In this study, epitaxial lithium niobate thin films were deposited on c-sapphire (α-Al2O3) by the low-cost, open-atmosphere Combustion Chemical Vapor Deposition (CCVD) technique developed by MicroCoating Technologies, Inc. It was found that deposition temperature plays a critical role in determining the growth behavior and quality of the lithium niobate thin films. XRD measurements show that the lithium niobate films are epitaxial with two in-plane orientations (twin structure). A surface roughness (root mean square) of about 4 nm was obtained from the deposited film (about 200 nm thick), as measured by optical profilometry.
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