Fabrication and photoluminescence characteristics of nonuniform Yb-Er codoped films

Abstract

The nonuniform Yb-Er Codoped Al 2O 3 films were prepared on SiO 2/Si substrates using a medium frequency magnetron sputtering system. Two asymmetry targets in the system were introduced to realize the nonuniform dopant. Some curves of Photoluminescence (PL) peak intensity were obtained by adjusting the deposition parameters, such as, the pillar number of erbium and ytterbium in the mixed target and the distance between a sample table and targets. Typically, the curve of PL peak intensity against the offset distance was approximately linear. The ratio of the PL intensity at the two ends of the same sample was 12.6 and the slope was 71.83/mm when the pillar numbers of the erbium and ytterbium in the mixed target are 5 and 60, respectively, and the distance between targets and the sample table is 2.9 cm.