Fabrication and high-temperature tribological performance of doped diamond film with B, N, and Si elements

Abstract

The diamond film is prone to oxidation in environment above 600 °C, making it difficult to maintain good wear resistance at high-temperatures. The high temperature oxidation resistance of diamond films can be improved through multiple doping. However, its wear resistance and anti-friction performance during high-temperature processing remain to be studied. In this study, single-doped, co-doped, and multi-doped diamond films with B, N, and Si doping combinations were fabricated on the surface of cemented carbide substrates. Performance characterization and high-temperature friction experiments were carried out on these films. The results show that B-doping can enhance wear resistance at high temperatures, N-doping can improve hardness, and Si-doping can reduce the coefficient of friction (CoF) of the diamond film. The multi-doped diamond film exhibits a comprehensive improvement effect due to the combination of different doping elements. During the high-temperature friction process, its CoF is significantly lower than that of undoped diamond film, resulting in a relatively high surface finish of the silicon nitride ball friction against it. Additionally, its excellent high-temperature wear resistance leads to minimal grain wear on the film surface and a low degree of transition from diamond to graphite phase on the surface. This study provides valuable insights for the application of multiple doped diamond films in high-temperature processing.